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Blazed reflection grating fabrication methods

机译:闪耀反射光栅的制作方法

摘要

PURPOSE:To enhance the diffraction efficiency of the blaze reflection diffraction grating produced by an ion beam etching method. CONSTITUTION:A substrate 1 formed with resist patterns is etched by irradiating this substrate with an ion beam from the direction diagonally intersected with grating grooves and inclined from the substrate. Since the substrate is irradiated with the ion beam from the direction intersecting orthogonally with the grating grooves, the inclination of the ion beam with the substrate is increased and the plane on the side opposite from the glaze plane of the grating is steepened, by which the diffraction efficiency is enhanced.
机译:目的:提高离子束刻蚀法制备的火焰反射衍射光栅的衍射效率。组成:用光刻胶图案形成的基板1是通过从与光栅凹槽斜交的方向上倾斜并从基板倾斜的方向向该基板照射离子束而蚀刻的。由于从与光栅槽正交的方向向基板照射离子束,因此离子束与基板的倾斜度增加,并且与光栅的釉面相反的一侧的平面变陡,由此,衍射效率得到提高。

著录项

  • 公开/公告号JP2982832B2

    专利类型

  • 公开/公告日1999-11-29

    原文格式PDF

  • 申请/专利权人 SHIMAZU SEISAKUSHO KK;

    申请/专利号JP19910103659

  • 发明设计人 KOEDA MASARU;

    申请日1991-02-18

  • 分类号G02B5/18;

  • 国家 JP

  • 入库时间 2022-08-22 01:57:53

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