PURPOSE:To enhance the diffraction efficiency of the blaze reflection diffraction grating produced by an ion beam etching method. CONSTITUTION:A substrate 1 formed with resist patterns is etched by irradiating this substrate with an ion beam from the direction diagonally intersected with grating grooves and inclined from the substrate. Since the substrate is irradiated with the ion beam from the direction intersecting orthogonally with the grating grooves, the inclination of the ion beam with the substrate is increased and the plane on the side opposite from the glaze plane of the grating is steepened, by which the diffraction efficiency is enhanced.
展开▼