recovery of the damage of the oxide field caused by high energy ion implantation processes and procedures

• 1. 一种高能离子注入工艺中形成高深宽比隔离的方法 [P] . 中国专利： CN107248495B . 2020.01.24
• 2. 一种高能离子注入工艺中形成高深宽比隔离的方法 [P] . 中国专利： CN107248495A . 2017-10-13
• 3. recovery of the damage of the oxide field caused by ion implantation at high energy and manufacturing processes [P] . IT1305829B1 . 2001-05-16

  机译： 高能量和制造工艺中离子注入引起的氧化场损伤的恢复

• 4. Recovery of damages in a field oxide caused by high energy ion implant process [P] . 美国专利： US6225231B1 . 2001-05-01

  机译： 恢复由高能离子注入过程引起的场氧化物损伤

• 5. METHOD FOR REDUCING DAMAGE TO AND LESIONS OF SURFACES IN THE PROPAGATION FIELD OF HIGH-ENERGY PRESSURE WAVES, USING AN AGENT FOR REDUCING BUBBLE FORMATION CAUSED BY THE PRESSURE WAVES, AND PRESSURE WAVE GENERATING DEVICE FOR IMPLEMENTING SAID METHOD [P] . 欧洲知识产权局专利： EP0610434A1 . 1994-08-17

  机译： 一种用于减少由压力波引起的气泡形成的代理商以及一种用于实现上述方法的减小压力波产生装置的减少高能压力波传播领域中的表面损伤和缺陷的方法

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• 2. Damage and Recovery Behavior of 4H-SiC Implanted with He Ions [J] . Yang Yitao, Zhang Chonghong 中国科学院近代物理研究所和兰州重离子研究装置年报：英文版 . 2019,第001期
• 3. Bioeffects of Low Energy Ion Beam Implantation: DNA Damage, Mutation and Gene Transter [J] . TANG Mingli, YU Zengliang 等离子体科学和技术（英文版） . 2007,第004期
• 4. Evidence for Base Substitutions and Repair of DNA Mismatch Damage Induced by Low Energy N+ Ion Beam Implantation in E. coli [J] . 高技术通讯（英文版） . 2003,第002期
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• 7. Iron oxide nanoparticles and magnetic field exposure promote functional recovery by attenuating free radical-induced damage in rats with spinal cord transection [O] . Ajay Pal, Anand Singh, Tapas C Nag, 2013
• 8. Edwards v Chesterfield Royal Hospital - Parliamentary Intention and Damages Caused by Maladministration of a Contractual Dismissal Procedure [O] . Costello, Kevin 2013
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• 1. STUDIES　OF　THE　LATTICE　DAMAGE　CAUSED　BY　ION　IMPLANTATION　INTO　Al_xGa₍1－x_AS／GaAs [J] . . 中国化学快报：英文版 . 1994,第8期
• 2. 灵芝通过抑制雌激素受体损伤，恢复紫外线引起的雌激素信号阻碍 [C] . 田中浩 ,村上祐子 ,中田悟 . 第八届中国化妆品学术研讨会 . 2010
• 3. 高能离子注入工艺入射角与高压器件阱工艺均一性关系的研究 [A] . 秦心宇 . 2016