METHOD OF HOT-FILAMENT CHEMICAL VAPOR DEPOSITION OF DIAMOND

摘要

A hot-filament assisted CVD process is disclosed for depositing diamond crystals and diamond films on a substrate (2). The substrate is positioned at a distance from a hot filament (9) in a reaction chamber (1). A liquid precursor solution (6) of methanol is introduced into the reaction chamber through a liquid flow controller (8) and is vaporized. The filament (9) is heated to a sufficient high temperature so that the vapor of the precursor (b) is dissociated to produce etchant radicals and carbon containing radicals for diamond deposition.