首页> 外国专利> METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUTOR DEVICE, NARROW PITCH CONNECTOR, ELECTROSTATIC ACTUATOR, PIEZOELECTRIC ACTUATOR, INK JET HEAD, INK JET PRINTER, MICROMACHINE, LIQUID CRYSTAL PANEL, AND ELECTRONIC DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUTOR DEVICE, NARROW PITCH CONNECTOR, ELECTROSTATIC ACTUATOR, PIEZOELECTRIC ACTUATOR, INK JET HEAD, INK JET PRINTER, MICROMACHINE, LIQUID CRYSTAL PANEL, AND ELECTRONIC DEVICE

机译:制造半导体器件,半导体器件,窄间距连接器,静电致动器,压电致动器,喷墨头,喷墨打印机,微机械,液晶面板和电子设备的制造方法

摘要

A method of manufacturing a semiconductor device which causes no short circuit therein because of dust floating in the air, a semiconductor device, a narrow pitch connector, a micromachine such as an electrostatic actuator or a piezoelectric actuator, and an ink jet head, an ink jet printer, a liquid crystal panel, and an electronic apparatus including these devices are disclosed. The method of manufacturing a plurality of semiconductor devices (20) by dicing a silicon wafer (30) comprises making grooves (30a) covered with insulating layers in the silicon wafer and extending across dicing lines and dicing the wafer along the dicing lines.
机译:一种制造半导体器件的方法,该方法不会因空气中的浮尘而在其中造成短路;一种半导体器件;窄间距连接器;诸如静电致动器或压电致动器的微机械;以及喷墨头,墨水公开了包括这些装置的喷墨打印机,液晶面板和电子设备。通过对硅晶片(30)进行切割而制造多个半导体器件(20)的方法包括:在硅晶片中形成覆盖有绝缘层的凹槽(30a),并延伸穿过切割线并沿着切割线对晶片进行切割。

著录项

  • 公开/公告号WO0059050A1

    专利类型

  • 公开/公告日2000-10-05

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORPORATION;SATO EIICHI;

    申请/专利号WO2000JP02072

  • 发明设计人 SATO EIICHI;

    申请日2000-03-31

  • 分类号H01L41/08;H01L21/78;H01R24/00;

  • 国家 WO

  • 入库时间 2022-08-22 01:49:31

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