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High thermal conductive silicon nitride structural member, semiconductor package, heater and thermal head

机译:高导热氮化硅结构构件,半导体封装,加热器和热敏头

摘要

A high thermal conductive silicon nitride structural member (1,7) of the present invention contains a rare earth element in the range of 1.0 to 7.5 wt. % calculated as oxide thereof and Li, Na, K, Fe, Ca, Mg, Sr, Ba, Mn and B as impurity cationic elements in a total amount not greater than 0.3 wt. %, and has the thermal conductivity not less than 60 W/(m . K), preferably not less than 80 W/(m . K). Also, a high thermal conductive silicon nitride sintered body consists of silicon nitride particles and a grain boundary phase, a crystal compound phase in the grain boundary phase being not less than 20 vol. %, preferably not less than 50 vol. %, with respect to the entire grain boundary phase, and has the thermal conductivity not less than 60 W/(m . K), preferably not less than 80 W/(m . K). A semiconductor package (9) of the present invention comprising a ceramic substrate (1) on which a semiconductor chip (2) is mounted, lead frames (5) joined to the same surface of the ceramic substrate as on which the semiconductor chip is mounted, and bonding wires (6) for electrically connecting the semiconductor chip and the lead frames, wherein the ceramic substrate is formed of the above high thermal conductive silicon nitride sintered body. IMAGE
机译:本发明的高导热氮化硅结构构件(1,7)包含1.0至7.5重量%的稀土元素。另外,作为杂质的阳离子元素,以氧化物的%计,作为杂质阳离子元素的Li,Na,K,Fe,Ca,Mg,Sr,Ba,Mn,B为0.3重量%。 %,并且具有不小于60W /(m·K),优选不小于80W /(m·K)的热导率。另外,高导热性氮化硅烧结体由氮化硅颗粒和晶界相构成,该晶界相中的结晶化合物相为20vol以上。 %,优选不小于50体积%。相对于整个晶界相,其热导率不小于60W /(m·K),优选不小于80W /(m·K)。本发明的半导体封装件(9)包括:陶瓷基板(1),其上安装有半导体芯片(2);以及引线框架(5),其接合到陶瓷基板与安装有半导体芯片的同一表面上。以及将半导体芯片与引线框架电连接的接合线(6),其中,陶瓷基板由上述高导热性氮化硅烧结体形成。 <图像>

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