METHOD FOR THE PURIFICATION OF HIGH PURITY ISOPROPYL ALCOHOL FOR CLEANING SEMICONDUCTOR

摘要

The present invention relates to a kind of methods to be used for the clean ultra-pure isopropanol of semiconductor for purifying, it can manage inorganic impurity to purify in isopropanol purification process in a conventional isopropanol purification process, such as metal ion removes inorganic impurity, such as metal ion, so that last purified product can be cleaned by ultra-high purity isopropanol, it is used as a detergent of the semiconductor of 256 MB or more.