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Metal electrodeposition process, especially for plastic and copper surface regions of circuit boards, uses a nickel and-or cobalt reduction plating bath containing a stabilizer to prevent autocatalytic deposition

机译:金属电沉积工艺(特别是电路板的塑料和铜表面区域)使用含有稳定剂的镍和/或钴还原镀液来防止自催化沉积

摘要

Metal electrodeposition on non-conductive surfaces, using a nickel and/or cobalt reduction plating bath containing a stabilizer to prevent autocatalytic deposition. Metal is electrodeposited on non-conductive surfaces by treating with a precious metal-activation bath, treating with a nickel and/or cobalt reduction plating bath and electrodepositing the metal layer, the novelty being that the deposition bath contains (a) a stabilizing compound to prevent autocatalytic nickel and/or cobalt deposition; or (b) -15 mg/l lead as a lead(II) compound. An Independent claim is also included for a nickel and/or cobalt deposition bath containing a nickel and/or cobalt ion source, a nickel and/or cobalt ion reducing agent and a stabilizing compound for preventing autocatalytic nickel and/or cobalt deposition. The non-conductive surfaces are conditioned with a substance for promoting adsorption of precious metal nuclei.
机译:使用包含稳定剂以防止自催化沉积的镍和/或钴还原镀液在非导电表面上进行金属电沉积。通过用贵金属活化浴处理,用镍和/或钴还原镀敷浴处理并电沉积金属层,可将金属电沉积在非导电表面上,其新颖之处在于沉积浴包含(a)稳定化的化合物防止自催化镍和/或钴沉积;或(b)-15 mg / l铅作为铅(II)化合物。对于包含镍和/或钴离子源,镍和/或钴离子还原剂以及用于防止自催化镍和/或钴沉积的稳定剂的镍和/或钴沉积浴,也包括独立权利要求。非导电表面用促进贵金属核吸附的物质调节。

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