首页>
外国专利>
E-beam/microwave gas jet PECVD method and apparatus for depositing and/or surface modification of thin film materials
E-beam/microwave gas jet PECVD method and apparatus for depositing and/or surface modification of thin film materials
展开▼
机译:用于沉积和/或表面改性薄膜材料的电子束/微波气体喷射PECVD方法和设备
展开▼
页面导航
摘要
著录项
相似文献
摘要
A novel high speed, high quality plasma enhanced surface modification or CVD thin-film deposition method and apparatus. The invention employs both microwave and e-beam energy for creation of a plasma of excited species which modify the surface of substrates or are deposited onto substrates to form the desired thin film. The invention also employs a gas jet system to introduce the reacting species to the plasma. This gas jet system allows for higher deposition speed than conventional PECVD processes while maintaining the desired high quality of the deposited materials.
展开▼