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Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma
Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma
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机译:施加射频功率的装置和方法产生等离子体的装置和方法以及利用等离子体进行处理的装置和方法
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摘要
On the bottom of a chamber, there is provided a lower electrode for supporting an object to be processed with intervention of an insulator. A first RF power source applies RF power to a multiple spiral coil composed of four spiral coil elements connected in parallel via an impedance matcher. The length of each of the coil elements corresponds to 1/4 of the wavelength of the RF power supplied from the first RF power source. A second RF power source applies an RF bias voltage to the lower electrode.
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