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Integrated waveguide device and method of fabricating the integrated waveguide device

机译:集成波导装置及其制造方法

摘要

A method of fabricating an integrated waveguide device includes forming a ridge having a width that varies in a tapered shape along the [011] direction on a semiconductor substrate and growing a laminated layer structure including a light waveguide layer where the width varies in a tapered shape of the ridge so that a waveguide has a tapered shape in the laminated layer structure, thereby producing an integrated waveguide device having a tapered light waveguide. The thickness of the semiconductor layer and the wavelength guided by the waveguide are controlled with high precision and the reliability of the device is enhanced.
机译:一种制造集成波导装置的方法,包括:在半导体基板上形成具有沿着[011]方向以锥形形状变化的宽度的脊;以及生长包括宽度以锥形形状变化的光波导层的层压层结构。这样,在层叠结构中波导具有锥形形状,从而制造出具有锥形光波导的集成波导装置。半导体层的厚度和由波导引导的波长被高精度地控制,并且提高了装置的可靠性。

著录项

  • 公开/公告号US6037189A

    专利类型

  • 公开/公告日2000-03-14

    原文格式PDF

  • 申请/专利权人 MITSUBISHI DENKI KABUSHIKI KAISHA;

    申请/专利号US19950542538

  • 发明设计人 KATSUHIKO GOTO;

    申请日1995-10-13

  • 分类号H01L21/20;

  • 国家 US

  • 入库时间 2022-08-22 01:37:38

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