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High integrity borderless vias with HSQ gap filled patterned conductive layers
High integrity borderless vias with HSQ gap filled patterned conductive layers
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机译:具有HSQ间隙填充的图案化导电层的高完整性无边界过孔
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摘要
Borderless vias are formed in electrical connection with a lower metal feature of a metal pattern gap filled with HSQ. Heat treatment in an inert atmosphere is conducted before filling the through- hole to outgas water absorbed during solvent cleaning of the through-hole, thereby reducing via void formation and improving via integrity.
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