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DRAM and SRAM memory cells with repressed memory

机译:具有受压存储器的DRAM和SRAM存储单元

摘要

The transfer device of a typical DRAM cell is replaced with a transistor having an additional gate. The unique cell can be accessed as a typical DRAM cell by reading from or writing to a storage capacitor or as a nonvolatile memory by storing charges on the additional gate. Thus, a DRAM cell having a nonvolatile memory component within its cell is formed in a simple and cost effective manner. Transistors in a typical SRAM cell are also replaced by the transistors with the additional gate to form a SRAM cell having a nonvolatile component built within its cell.
机译:典型的DRAM单元的传输装置被具有附加栅极的晶体管代替。可以通过对存储电容器进行读取或写入来将唯一单元作为典型的DRAM单元进行访问,或者通过将电荷存储在附加栅极上来作为非易失性存储器进行访问。因此,以简单且成本有效的方式形成在其单元内具有非易失性存储组件的DRAM单元。典型的SRAM单元中的晶体管也被具有附加栅极的晶体管代替,以形成具有在其单元内构建的非易失性成分的SRAM单元。

著录项

  • 公开/公告号US6141248A

    专利类型

  • 公开/公告日2000-10-31

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US19990362909

  • 发明设计人 ALAN R. REINBERG;LEONARD FORBES;

    申请日1999-07-29

  • 分类号G11C14/00;

  • 国家 US

  • 入库时间 2022-08-22 01:35:48

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