EQUIPMENT FOR WASTE GAS TREATMENT IN SEMICONDUCTOR PRODUCTION

摘要

PROBLEM TO BE SOLVED: To provide an equipment for waste gas treatment in a semiconductor production in which waste gas silane(SiH4) in a semiconductor production process is subjected to a combustion treatment in advance, and the gas is sent to a waste gas treating equipment for decomposition of fluorocarbon(PFC) of an original treatment target, and silica is prevented from adhering on a silane decomposition apparatus and a fluorocarbon decomposition apparatus.;SOLUTION: In an equipment for detoxification treatment of waste gas in a semiconductor production for treating waste gas containing at least fluorocarbon(PFC) and silane(SiH4), a silane-treating equipment is disposed in a preceding stage to another waste gas treatment equipment for treating fluorocarbon. The silane-treating equipment comprises a silane-containing waste gas inlet 2, an ignition burner 1, and a combustion air inlet 3. The waste gas inlet 2 is inserted in the inside of the silane treating equipment, and the outlet from the waste gas inlet 2 is positioned downstream of the ignition burner 1, the outlet of the combustion air inlet 3 is positioned downstream of the outlet of the waste gas inlet 2, and the combustion air is mixed with the waste gas in the downstream side of the outlet from the waste gas inlet 2.;COPYRIGHT: (C)2001,JPO