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Long wave long band surface-emitting type semiconductor laser and its production manner

机译:长波长波段面发射型半导体激光器及其生产方式

摘要

PROBLEM TO BE SOLVED: To confine electrons excellently even at a high temperature and to reduce deterioration of characteristics, by forming an active layer of a semiconductor layer not lattice-matched with both InP and GaAs, and increasing discontinuous energy of conduction bands of a clad layer and a quantum well active layer. ;SOLUTION: An N-type GaAs/AlAs multilayer-film reflecting mirror 2 is laminated on an N-type GaAs substrate 1, and an ion implantation region 3 forming current constriction structure is formed. A GaAs thin-film layer 4 is bonded with the reflecting mirror 2, and an N-type clad layer 5, a quantum well active layer 6 and a P-type clad layer 7 are laminated on the thin-film layer 4. A P-type GaAs/AlAs multilayer reflecting mirror 8 is bonded with the clad layer 7, and has a P-type electrode 9. Laser beams are emitted from the rear of the substrate 1. The N-type and P-type clad layers 5, 7 and a light- emitting active layer 6 are formed of a material not lattice-matched with both InP and GaAs. In such structure, discontinuous energy of the conduction bands of the clad layers and a quantum well layer is increased.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:通过形成与InP和GaAs均不晶格匹配的半导体层的有源层,并增加包层的导带的不连续能量,即使在高温下也能出色地限制电子并减少特性劣化。层和量子阱活性层。 ;解决方案:在N型GaAs基板1上层压N型GaAs / AlAs多层膜反射镜2,并形成形成电流限制结构的离子注入区3。 GaAs薄膜层4与反射镜2结合,并且N型包覆层5,量子阱活性层6和P型包覆层7层叠在薄膜层4上。型GaAs / AlAs多层反射镜8与覆层7结合,并具有P型电极9。从衬底1的背面发射激光束。N型和P型覆层5,如图7所示,发光有源层6由与InP和GaAs都不晶格匹配的材料形成。在这种结构中,包覆层和量子阱层的导带的不连续能量增加。;版权所有:(C)1999,JPO

著录项

  • 公开/公告号JP3132445B2

    专利类型

  • 公开/公告日2001-02-05

    原文格式PDF

  • 申请/专利权人 日本電気株式会社;

    申请/专利号JP19970318609

  • 发明设计人 山田 みつき;

    申请日1997-11-19

  • 分类号H01S5/183;

  • 国家 JP

  • 入库时间 2022-08-22 01:32:39

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