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WAFER PROBER AND CERAMIC SUBSTRATE TO BE USED THEREFOR AND WAFER PROBER DEVICE
WAFER PROBER AND CERAMIC SUBSTRATE TO BE USED THEREFOR AND WAFER PROBER DEVICE
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机译:晶圆专用和陶瓷基质可用于此和晶圆专用设备
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摘要
PROBLEM TO BE SOLVED: To provide a ceramic substrate to be used for a wafer prober with excellent temperature ascending and descending characteristics for preventing generation of bending without shifting a silicon wafer even at the time of tightly sucking and fixing the placed silicon wafer and pressing it with a tester pin, and for preventing the damage to the wafer or measurement error. ;SOLUTION: A conductive layer 2 is formed on the surface of a ceramic substrate 3, and plural concentric circular grooves 7 are formed on the ceramic substrate 3, and through-holes 8 are formed at one pert of the grooves 7, and concentric circular heating elements 41 are arranged on the bottom face of the ceramic substrate 3 so that a ceramic substrate 3 to be used for a wafer prober 101 can be constituted.;COPYRIGHT: (C)2001,JPO
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