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THIN FILM DEPOSITION DEVICE AND SHUNTING ARC DISCHARGE ELECTRODE DEVICE
THIN FILM DEPOSITION DEVICE AND SHUNTING ARC DISCHARGE ELECTRODE DEVICE
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机译:薄膜沉积装置和圆弧放电电极装置
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摘要
PROBLEM TO BE SOLVED: To remarkably increase the evaporating quantity and ion quantity and to improve the productivity by generating shunting arc discharge by an electrode of a wide area and evaporating and ionizing an electrode material. ;SOLUTION: In a thin film deposition device provided with at least one or more electrodes 3 generating shunting arc discharge in a treating vessel 2 and an arc power source 4 making an arc current for generating shunting arc to flow through the electrode 3, the electrode 3 is composed in such a manner that at least one or more electrically conductive introducing part 16 generating shunting arc discharge are connected to an electrically conductive electrode body 12 composed of an evaporated and ionized material, and the arc power source 4 is connected to the electrode 3 so as to feed an arc current to the electrode body 12 and the introducing part 16.;COPYRIGHT: (C)2001,JPO
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