首页> 外国专利> INTERMITTENT QUANTITATIVE APPLICATION APPARATUS, INTERMITTENT QUANTITATIVE APPLICATION METHOD, THICK FILM PATTERN FORMING APPARATUS, AND THICK FILM PATTERN FORMING METHOD

INTERMITTENT QUANTITATIVE APPLICATION APPARATUS, INTERMITTENT QUANTITATIVE APPLICATION METHOD, THICK FILM PATTERN FORMING APPARATUS, AND THICK FILM PATTERN FORMING METHOD

机译:间歇定量应用装置,间歇定量应用方法,厚膜图案形成装置和厚膜图案形成方法

摘要

PROBLEM TO BE SOLVED: To control the amount of an excess protrusion by a method in which in a method for forming a projecting pattern of an ionizing radiation curable resin composition directly on a rigid plate by a rotary intaglio method and a sheet intaglio method, when the transfer in a limited range of the pattern to a plate is necessary, the ionizing radiation curable resin is applied in advance on an ionizing radiation transmittable film in quantitative width, thickness, and length.;SOLUTION: An intermittent application apparatus which applies the ionizing radiation curable resin on the ionizing radiation transmittable film before being roll-pressed in optional width and thickness by a knife coating method and further applies the resin by a shutter function in optional length is provided.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:通过以下方法控制过量的突出量:在该方法中,当通过旋转凹版方法和片状凹版方法在硬板上直接形成电离辐射固化性树脂组合物的投影图案时,如果需要在一定范围内将图案转移到板上,则应将电离辐射固化树脂预先以定量的宽度,厚度和长度施加到电离辐射可透射膜上;解决方案:一种间歇式施加设备,用于施加电离提供一种可辐射固化的树脂,该离子可固化的树脂先通过刮刀涂布法辊压成任意宽度和厚度,然后再通过快门功能以任意长度施加在电离辐射可透过薄膜上。(版权):( C)2001,JPO

著录项

  • 公开/公告号JP2001232259A

    专利类型

  • 公开/公告日2001-08-28

    原文格式PDF

  • 申请/专利权人 TOPPAN PRINTING CO LTD;

    申请/专利号JP20000049248

  • 申请日2000-02-25

  • 分类号B05C1/14;B05C9/12;B05C11/04;B05D3/06;H01J9/02;H01J11/02;

  • 国家 JP

  • 入库时间 2022-08-22 01:30:05

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