SAMPLE HOLDER FOR MEASURING DIFFRACTION OF OBLIQUELY EMITTED X-RAYS AND APPARATUS AND METHOD FOR MEASURING DIFFRACTION OF OBLIQUELY EMITTED X-RAYS USING THE SAME

摘要

PROBLEM TO BE SOLVED: To measure a diffraction pattern having a desired S/B ratio by reducing the scattering of air around a sample by a simple method without scaling up an apparatus in the case of the measurement of the diffraction of obliquely emitted X-rays. ;SOLUTION: A sample holder 15 for measuring the diffraction of obliquely emitted X-rays is constituted of a container 14 holding a sample 3 therein, and an atmosphere control means 13 for controlling the atmosphere in the container 14. An X-ray incident window 11 for permitting primary X-rays 4 to transmit to allow the same to be incident on the sample 3, and an X-ray emitting window 12 for permitting diffracted X-rays to transmit to emit the same to the outside, are formed to the container 14 so as to be separated mutually. When the diffraction of obliquely emitted X-rays is measured, primary X-rays 4 are emitted from an X-ray source 9 in such a state that the atmosphere in the container 14 holding the sample 3 therein is controlled by the atmosphere control means 13 to be diffracted by the sample 3, and the diffracted X-rays 5 are detected and recorded by an X-ray detector 6 to measure the diffraction pattern of the sample 3.;COPYRIGHT: (C)2001,JPO