AUTOMATIC DESIGN METHOD, MASK SET FOR EXPOSURE, SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, PRODUCING METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND RECORDING MEDIUM WITH RECORDED AUTOMATIC DESIGN PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide an automatic design method with which the terminal layout of slanted wirings is efficiently performed with a little computational quantity. SOLUTION: This automatic design method for wiring pattern is provided with a step for generating horizontal wirings 11 having an arbitrary line width, a step for generating slanted wirings 13, which have an arbitrary line width, are extended obliquely at 45 deg. to the horizontal wirings and overlap the terminal parts of horizontal wirings, and a step for setting connecting patterns 15A for connecting horizontal wirings and slanted wirings at the intersections of a centerline in the lengthwise direction of horizontal wirings and a centerline in the lengthwise direction of slanted wirings at least inside an overlap area, where the terminals of horizontal wirings 11 and the terminals of slanted wirings 13 are overlapped.