AUTOMATIC DESIGN METHOD, MASK SET FOR EXPOSURE, SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, PRODUCING METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND RECORDING MEDIUM WITH RECORDED AUTOMATIC DESIGN PROGRAM

摘要

PURPOSE: To provide an automatic design method with which the terminal layout of slanted wirings is efficiently performed with a little computational quantity. CONSTITUTION: This automatic design method for wiring pattern is provided with a step for generating horizontal wirings 11 having an arbitrary line width, a step for generating slanted wirings 13, which have an arbitrary line width, are extended obliquely at 45 to the horizontal wirings and overlap the terminal parts of horizontal wirings, and a step for setting connecting patterns 15A for connecting horizontal wirings and slanted wirings at the intersections of a centerline in the lengthwise direction of horizontal wirings and a centerline in the lengthwise direction of slanted wirings at least inside an overlap area, where the terminals of horizontal wirings 11 and the terminals of slanted wirings 13 are overlapped.