MULTIBEAM EXPOSURE APPARATUS COMPRISING MULTIAXIS ELECTRON LENS, MULTIAXIS ELECTRON LENS FOR FOCUSING MULTIPLE ELECTRON BEAM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

An electron beam exposure apparatus characterized by comprising a multiaxis electron lens which has a lens portion magnetic conductive part provided with apertures and arranged generally parallel and a nonmagnetic conductive part disposed between the lens portion magnetic conductive parts and provided with through holes and in which the apertures and through holes form lens apertures through which beams pass.