Multibeam exposure apparatus comprising multiaxis electron lens multiaxis electron lens for focusing multiple electron beam and method for manufacturing semiconductor device

摘要

A plurality of openings and a plurality of lens sections magnetic conductor arranged in a substantially parallel, and the art is provided between the plurality of lens sections magnetic conductor portion and includes a non-magnetic conductor including a plurality of through, a plurality of openings and a plurality of providing an electron beam exposure apparatus characterized in that the through portion comprises a multi-axis electron lens for forming a plurality of lens openings for passing the plurality of beams.