An interconnect structure (13) for connecting electrical components (18) that includes a plurality of micromachined silicon cantilever beams (12). The cantilever beams (12) are formed having a shape dictated by predetermined scaling rules that determine the mechanical and electrical properties of the cantilever beam. The cantilever beams (12) are arranged in two generally parallel rows and are mounted to a dielectric material (14) to form a recess between the rows. An electrical component (18) may be inserted into the recess to create a contact force against the cantilever beams (12) to place the component (18) and the interconnect into electrical communication. Also, an electrical connector system may be constructed having a first electrical connector comprising a contact formed of metalized silicon and a base supporting the contact, and a second electrical connector mateable with the first electrical connector that comprises a contact formed of metalized silicon and a base supporting the contact. Further, a method of reducing the pitch between adjacent contacts in an electrical connector and scaling an electrical connector so as to maintain a generally constant near-end cross talk and characteristic impedance are provided.
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