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ALIGNER EXPOSURE METHOD METHOD OF PRESSURE ADJUSTMENT OF PROJECTION OPTICAL SYSTEM AND METHOD OF ASSEMBLING ALIGNER

机译:投影光学系统压力调整的ALIGNER曝光方法和装配ALIGNER的方法

摘要

The exposure light from the exposure light source 100 via the illumination optical system 200 lighting on the reticle R, and an image of the pattern in the projection optical system 300 in the exposure apparatus for projecting on the photosensitive substrate W, a projection optical system (300) a space formed between the optical elements in the lens barrel LB to accommodate the gas supply device 150 for charging the inert gas (310, 311), a pressure detector for detecting the pressure in the space PS2, PS3 and detected by the pressure detector PS2, PS3 and a performance optical control device (303, 304) for controlling the optical performance of the projection optical system 300 according to the pressure. Optical performance regulating device is a device for adjusting the device, or, the pressure space between the optical element for adjusting the distance between the pair of optical elements.
机译:经由照明光学系统200的来自曝光光源100的曝光光在掩模版R上照明,并且在用于将其投影在感光基板W上的曝光装置中的投影光学系统300中的图案光学像是投影光学系统( 300)在镜筒LB中的光学元件之间形成以容纳用于填充惰性气体的气体供给装置150的空间(310、311),用于检测空间PS2,PS3中的压力并通过压力检测的压力检测器。检测器PS2,PS3和用于根据压力控制投影光学系统300的光学性能的性能光学控制装置(303、304)。光学性能调节装置是用于调节该装置的装置,或者是用于调节光学元件对之间的距离的光学元件之间的压力空间。

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