ALCOHOL-BASED PROCESSORS FOR PRODUCING NANOPOROUS SILICA THIN FILMS

摘要

The present invention relates to nanoporous dielectric films and methods of making them. Such films are useful for making integrated circuits. This film is;At least one alkoxysilane;;Composed of a linear or branched C ₁ -C ₄ alkyl ether of a water-miscible C ₁ -C ₄ alkylene glycol to the alkoxy silane,;At least one relatively low volatility solvent composition having a hydroxyl concentration of at most 0.0084 mol / cm ³ , a boiling point of at least about 175 ° C. at atmospheric pressure, and a weight average molecular weight of at least about 120;;At least one relatively high volatility solvent composition having a lower boiling point than the relatively low volatility solvent composition;;Any water; And;It is prepared from a precursor consisting of an acid of any catalytic amount.