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Separation Process of Boron Compounds in Chlorosilanes and Composition for Evaporating Chlorosilanes

机译:氯硅烷中硼化合物的分离工艺及用于蒸发氯硅烷的组合物

摘要

PURPOSE: To remove or concentrate a minute amount of boron compounds in chlorosilanes with simple operation by allowing a fluorine-element-containing salt to act on the chlorosilanes containing boron compounds to adsorb the boron compounds on the salt. CONSTITUTION: This separation process comprises: adding a fluorine-element- containing salt to chlorosilanes; mildly agitating the resulting mixture at ordinary temperature; and thereafter, slowly evaporating the chlorosilanes to remove boron compounds in the chlorosilanes. Alternatively, the process comprises: packing a cylindrical vessel with a fluorine-element containing salt used as an adsorbent; and passing chlorosilanes through the vessel to adsorb boron compounds in the chlorosilanes on the salt. As the fluorine-element-containing salt, an electrolyte or more specifically, NaF, KF, CaF2, MgF2, NH4F, BaF2, triphenyltin fluoride, tributyltin fluoride, or the like, can be used. Such a fluorine-element-containing salt is added to chlorosilanes in an amount sufficient to provide a stoichiometrical molar ratio of 1:1 of the amount of the salt to the boron compound content in the chlorosilanes.
机译:用途:通过使含氟元素的盐作用于含硼化合物的氯硅烷上,使硼化合物吸附在盐上,从而通过简单的操作即可除去或浓缩微量的硼化合物。组成:该分离过程包括:将含氟元素的盐添加到氯硅烷中;在常温下温和搅拌所得混合物;然后,缓慢蒸发氯硅烷以除去氯硅烷中的硼化合物。可选地,该方法包括:用含有用作吸附剂的盐的氟元素填充圆柱形容器。使氯硅烷通过容器,使硼化合物吸附在盐上的氯硅烷中。作为含氟元素的盐,可以使用电解质或更具体地为NaF,KF,CaF 2,MgF 2,NH 4 F,BaF 2,氟化三苯锡,氟化三丁基锡等。将这种含氟元素的盐以足以使盐的量与氯硅烷中的硼化合物含量的化学计量摩尔比为1:1的量添加到氯硅烷中。

著录项

  • 公开/公告号KR20010049557A

    专利类型

  • 公开/公告日2001-06-15

    原文格式PDF

  • 申请/专利权人 SHIN-ETSU CHEMICAL CO. LTD.;

    申请/专利号KR20000033126

  • 发明设计人 MIYAO SHUICHI;WATANABE MUNAO;

    申请日2000-06-16

  • 分类号C01B33/107;

  • 国家 KR

  • 入库时间 2022-08-22 01:13:30

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