X-RAY EXPOSURE APPARATUS X-RAY EXPOSING METHOD X-RAY MASK X-RAY MIRROR SYNCHROTRON RADIATOR SYNCHROTRON RADIATING METHOD AND SEMICONDUCTOR DEVICE

摘要

The X-ray exposure apparatus comprises an X-ray mirror (3, 3a to 3c, 11 to 14) including a material having an absorption edge only in at least one of a wavelength region of less than 0.45 nm and a wavelength region of more than 0.7 nm with respect to X- Respectively.