X-RAY EXPOSURE APPARATUS, X-RAY EXPOSING METHOD, X-RAY MASK, X-RAY MIRROR, SYNCHROTRON RADIATOR, SYNCHROTRON RADIATING METHOD, AND SEMICONDUCTOR DEVICE

摘要

An X-ray exposure apparatus comprises an X-ray mirror (3, 3a to 3c, 11 to 14) containing a material having an absorption edge only in at least either one of a wavelength region of less than 0.45 nm and a wavelength region exceeding 0.7 nm as to X-rays. IMAGE