Production of elastic contacts comprises partially anisotropically plasma etching a polymer film located below a copper-etched hole

摘要

Production of elastic contacts comprises partially anisotropically plasma etching part of the polymer film located below a copper-etched hole and interrupting shortly before exposing the metallization of the inorganic substrate; removing overhangs on the holes; placing the sources for an elastic contact in two layers and after structuring the connections freely etching these contacts from the polymer film; and forming supporting columns of the polymer during polymer etching using the masking action of the through contacts. On separating and mounting the inorganic substrate support, the contacts remain fixed in position.