Capacitor production on a substrate by forming a lower electrode on the substrate, forming a dielectric layer on the electrode, oxygen radical or plasma heat treating the dielectric layer and forming the upper electrode

摘要

Production of a capacitor on a substrate comprises: (1) forming a lower electrode on the substrate; (2) forming a dielectric layer on the electrode; (3) oxygen radical or plasma heat treating the dielectric layer; and (4) forming the upper electrode on the treated dielectric layer. An Independent claim is also included for: (1) a device for producing a thin film on a substrate comprising a multifunctional chamber for depositing a dielectric layer on the substrate; and (2) an oxygen radical or plasma heat treating unit connected to the chamber.