Positive resist composition, useful for the processing of semiconductors, contains a resin derived from (meth)acrylic acid dihydroxy-1-adamantyl ester and (meth)acrylic acid-alkyl-2-adamantyl ester

摘要

A chemically reinforcing positive resist composition (I) comprises (A) a resin comprising (A1) a polymeric unit derived from (meth)acrylic acid dihydroxy-1-adamantyl ester and (A2) a polymer unit derived from (meth)acrylic acid-alkyl-2-adamantyl ester that is insoluble or poorly soluble in alkali but is soluble in alkali under the influence of an acid and (B) an acid producing agent.