首页> 外国专利> Transistor iii - v.sub.a heterojunction, in particular a field effect transistor hemt or bipolar transistor has heterojunction

Transistor iii - v.sub.a heterojunction, in particular a field effect transistor hemt or bipolar transistor has heterojunction

机译:晶体管iii-v。异质结,特别是场效应晶体管hemt或双极晶体管具有异质结

摘要

The heterojunction transistor comprises III-V semiconductor materials with a broad forbidden band material and a narrow forbidden band material. The narrow forbidden band material is an III-V compound containing gallium as one of its III elements and both arsenic and nitrogen as V elements, the nitrogen content being less than about 5%, and the narrow forbidden band material includes at least a fourth III or V element. Adding this fourth element makes it possible to adjust the width of the forbidden band, the conduction band discontinuity DeltaEc, and the valance band discontinuity DeltaEv of the heterojunction. The invention is applicable to making field effect transistors of the HEMT type having a very small forbidden band, and thus having high drain current. It also applies to making heterojunction bipolar transistors of small VBE, and thus capable of operating with power supply voltages that are very low.
机译:异质结晶体管包括具有宽禁带材料和窄禁带材料的III-V族半导体材料。禁带窄材料是III-V族化合物,其包含镓作为其III族元素之一,并且砷和氮均作为V元素,氮含量小于约5%,并且禁带窄材料包括至少第四III族。或V元素。添加该第四元素使得可以调整异质结的禁带宽度,导带不连续性DeltaEc和价带不连续性DeltaEv。本发明适用于制造具有非常小的禁带并因此具有高漏极电流的HEMT型场效应晶体管。这也适用于制造具有较小VBE的异质结双极晶体管,因此能够在非常低的电源电压下工作。

著录项

  • 公开/公告号FR2795871B1

    专利类型

  • 公开/公告日2001-09-14

    原文格式PDF

  • 申请/专利权人 PICOGIGA SA;

    申请/专利号FR19990008487

  • 发明设计人 LINH T NUYEN;

    申请日1999-07-01

  • 分类号H01L29/205;H01L29/737;

  • 国家 FR

  • 入库时间 2022-08-22 01:07:52

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