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Generation of low work function, stable compound thin films by laser ablation

机译:通过激光烧蚀产生低功函数,稳定的复合薄膜

摘要

Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500° C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.
机译:通过激光烧蚀产生低功函,稳定的复合薄膜。具有低功函数的复合薄膜可以通过例如同时激光烧蚀硅,并将碱金属热蒸发到氧气环境中来合成。例如,化合物薄膜可以由Si / Cs / O构成。薄膜的功函数可以通过改变硅/碱金属/氧的比例来改变。通过紫外光电子光谱法(UPS)证实了沉积在硅基底上的化合物薄膜的低功函。复合薄膜在高达500°C的温度下是稳定的。通过X射线光电子能谱(XPS)测量的C.。测试已经确定,对于化合物薄膜的某些化学成分和退火温度,检测到负电子亲和力(NEA)。低功函数,稳定的复合薄膜可用于太阳能电池,场致发射平板显示器,电子枪和冷阴极电子枪。

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