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Planar thin film head and method for forming a gap of a planar thin film magnetic head

机译:平面薄膜磁头和形成平面薄膜磁头的间隙的方法

摘要

A method for forming a gap of a planar thin film magnetic head and a planar thin film magnetic head formed thereby, includes a photoresist having a stepped surface is formed at one side from the center of a gap spacer pedestal. Also, a gap spacer of a diamond-like carbon material for forming the gap is formed at a side well of the photoresist, and one side of an upper pole piece is formed with a magnetic material over the other side from the center of the gap spacer pedestal. Further, the photoresist is etched and the other side of the upper pole piece is formed with a magnetic material over the exposed gap spacer pedestal.
机译:一种用于形成平面薄膜磁头的间隙的方法以及由此形成的平面薄膜磁头,其包括具有阶梯表面的光致抗蚀剂,该光致抗蚀剂形成在间隙间隔物基座的中心的一侧。此外,在光致抗蚀剂的侧阱处形成用于形成间隙的类金刚石碳材料的间隙隔离物,并且从间隙的中心的另一侧在上极靴的一侧形成有磁性材料。隔垫座。此外,蚀刻光致抗蚀剂,并且在暴露的间隙隔离物基座上方用磁性材料形成上极靴的另一侧。

著录项

  • 公开/公告号US6253445B1

    专利类型

  • 公开/公告日2001-07-03

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US19990256349

  • 发明设计人 WOO-YOUNG YOON;

    申请日1999-02-24

  • 分类号H01C10/20;

  • 国家 US

  • 入库时间 2022-08-22 01:03:56

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