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Method of producing air gap for reducing intralayer capacitance in metal layers in damascene metalization process and product resulting therefrom
Method of producing air gap for reducing intralayer capacitance in metal layers in damascene metalization process and product resulting therefrom
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机译:在镶嵌金属化工艺中产生气隙以减小金属层内层电容的方法及其产品
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摘要
A method of reducing intralevel capacitance in a damascene metalization process employs entrapped air gaps between metal lines. The method involves forming a metalization pattern using a damascene process which includes forming at least first and second metal regions separated by a dielectric region, forming an air gap at least partially within the dielectric region, and sealing the air gap to entrap the air gap between the first and second metal regions thereby reducing intralevel capacitance between the first and second metal regions.
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