首页> 外国专利> A-site and / or B-site modified PbZrTiO3 material and (Pb, Sr, Ca, Ba, Mg) (Zr, Ti, Nb, Ta) O3 film useful in ferroelectric random access memory and high performance thin film microactuator

A-site and / or B-site modified PbZrTiO3 material and (Pb, Sr, Ca, Ba, Mg) (Zr, Ti, Nb, Ta) O3 film useful in ferroelectric random access memory and high performance thin film microactuator

机译:A位和/或B位改性的PbZrTiO3材料和(Pb,Sr,Ca,Ba,Mg)(Zr,Ti,Nb,Ta)O3膜,可用于铁电随机存取存储器和高性能薄膜微致动器

摘要

A modified PbZrTiO3 perovskite crystal material thin film, wherein the PbZrTiO3 perovskite crystal material includes crystal lattice A-sites and B-sites at least one of which is modified by the presence of a substituent selected from the group consisting of (i) A-site substituents consisting of Sr, Ca, Ba and Mg, and (ii) B-site substituents selected from the group consisting of Nb and Ta. The perovskite crystal thin film material may be formed by liquid delivery MOCVD from metalorganic precursors of the metal components of the thin film, to form PZT and PSZT, and other piezoelectric and ferroelectric thin film materials. The thin films of the invention have utility in non-volatile ferroelectric memory devices (NV-FeRAMs), and in microelectromechanical systems (MEMS) as sensor and/or actuator elements, e.g., high speed digital system actuators requiring low input power levels.
机译:一种改性的PbZrTiO3钙钛矿晶体材料薄膜,其中所述PbZrTiO3钙钛矿晶体材料包括晶格A位和B位,其中至少一个被选自(i)A位的取代基的存在改性。由Sr,Ca,Ba和Mg组成的取代基,以及(ii)选自Nb和Ta的B位取代基。钙钛矿晶体薄膜材料可以通过液体输送MOCVD由薄膜金属成分的金属有机前体形成,以形成PZT和PSZT,以及其他压电和铁电薄膜材料。本发明的薄膜在非易失性铁电存储器件(NV-FeRAM)中,以及在微机电系统(MEMS)中作为传感器和/或致动器元件,例如要求低输入功率水平的高速数字系统致动器具有实用性。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号