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Production manner null of distribution feedback die semiconductor laser component and distribution feedback die semiconductor laser

机译:分布反馈芯片半导体激光器组件的生产方式及分布反馈芯片半导体激光器

摘要

PURPOSE: To manufacture a distributed feedback type semiconductor laser element with an excellent yield, which has a uniform diffraction grating formed over the whole stripe grooves, and has a structure of controlling the longitudinal mode of a light to be oscillated and a structure of controlling the lateral mode of the light. ;CONSTITUTION: By a first crystal growth process, a first clad layer 11, an active layer 12 and an optical waveguide layer 14 are sequentially formed on a semiconductor substrate 10. A diffraction grating 21 is formed on the surface of the optical waveguide layer 14. By a second crystal growth process, a current blocking layer 17 is formed on the optical waveguide layer 14 having the diffraction grating 21 formed thereon. The current blocking layer 17 is etched so that the diffraction grating 21 is exposed, thereby forming stripe grooves. By a third crystal growth process, a second clad layer 19 is formed on the current blocking layer 17 including the inside of the stripe grooves.;COPYRIGHT: (C)1993,JPO&Japio
机译:用途:制造具有良好成品率的分布式反馈型半导体激光元件,其在整个条状沟槽上均形成均匀的衍射光栅,并具有控制要振荡的光的纵向模式的结构和控制光的纵向模式的结构。光的横向模式。 ;组成:通过第一晶体生长工艺,在半导体衬底10上顺序形成第一覆盖层11,有源层12和光波导层14。在光波导层14的表面上形成衍射光栅21。通过第二晶体生长工艺,在其上形成有衍射光栅21的光波导层14上形成电流阻挡层17。蚀刻电流阻挡层17,使得暴露出衍射光栅21,从而形成条纹凹槽。通过第三晶体生长工艺,在包括条状沟槽的内部的电流阻挡层17上形成第二覆层19。版权所有:(C)1993,JPO&Japio

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