首页> 外国专利> TUNNEL MAGNETORESISTANCE EFFECT ELEMENT AND MANUFACTURING METHOD THEREFOR, AND TUNNEL MAGNETORESISTANCE EFFECT HEAD AND MANUFACTURING METHOD THEREFOR

TUNNEL MAGNETORESISTANCE EFFECT ELEMENT AND MANUFACTURING METHOD THEREFOR, AND TUNNEL MAGNETORESISTANCE EFFECT HEAD AND MANUFACTURING METHOD THEREFOR

机译:隧道磁阻效应元件及其制造方法,以及隧道磁阻效应头及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a tunnel magnetoresistance effect element, a tunnel magnetoresistance effect head and manufacturing methods therefor, which provides a high TMR ratio and low resistance at room temperature and allows the thickness of the tunnel barrier layer to be reduced, as compared with the conventional cases.;SOLUTION: A TMR element 70 has a laminated structure of a first ferromagnetic layer 24, a tunnel barrier layer 30 and a second ferromagnetic layer 42 laminated in this order. The tunnel barrier layer 30 is made to contain nickel chrome oxide NiCrOx, etc.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种隧道磁阻效应元件,隧道磁阻效应头及其制造方法,与之相比,其在室温下提供高的TMR比和低电阻,并允许减小隧道势垒层的厚度。解决方案:TMR元件70具有依次层叠的第一铁磁层24,隧道势垒层30和第二铁磁层42的叠层结构。使隧道势垒层30包含镍铬氧化物NiCrOx等;版权所有:(C)2002,JPO

著录项

  • 公开/公告号JP2002237628A

    专利类型

  • 公开/公告日2002-08-23

    原文格式PDF

  • 申请/专利权人 TDK CORP;

    申请/专利号JP20010344701

  • 发明设计人 ARAKI SATORU;SUN JIJUN;

    申请日2001-11-09

  • 分类号H01L43/08;G01R33/09;G11B5/39;H01F10/32;H01F41/32;H01L43/12;

  • 国家 JP

  • 入库时间 2022-08-22 00:57:19

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