首页> 外国专利> VACUUM TREATMENT APPARATUS HAVING ELECTROSTATIC ATTRACTION MECHANISM AND OPERATION CONTROL METHOD FOR ELECTROSTATIC ATTRACTION MECHANISM

VACUUM TREATMENT APPARATUS HAVING ELECTROSTATIC ATTRACTION MECHANISM AND OPERATION CONTROL METHOD FOR ELECTROSTATIC ATTRACTION MECHANISM

机译:具有静电吸引机理的真空处理装置及静电吸引机理的操作控制方法

摘要

PROBLEM TO BE SOLVED: To improve a quality of a substrate by suppressing the generation of particles due to electrostatic attraction and by improving the yield of the product, without decreasing a fixing performance of the substrate by using an electrostatic attraction mechanism and heating/cooling performance in a vacuum treatment apparatus having the electrostatic attraction mechanism.;SOLUTION: This apparatus comprises the electrostatic attraction mechanism for mounting and fixing the substrate, and is constituted so as to comprise a radiation thermometer 34 for detecting the temperature of the substrate 13, a temperature sensor 17 for detecting the temperature of the electrostatic attraction mechanism, and a comparator 38 that outputs a signal for operating the electrostatic attraction mechanism when the detected signals which each outputs are input and a difference of two detected signals is in a range satisfying a prescribed condition. The substrate is placed on the electrostatic attraction mechanism, if the electrostatic attraction mechanism is operated and the substrate is fixed and when the difference between the temperature of the substrate and the temperature of the electrostatic attraction mechanism became small to a degree of being included in a prescribed range, the electrostatic attraction mechanism is operated.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:通过抑制由于静电吸引而产生的颗粒并通过提高产品的产量来提高基板的质量,而不会通过使用静电吸引机制和加热/冷却性能而降低基板的固定性能。解决方案:该设备包括用于安装和固定基板的静电吸引机构,并且构成为包括用于检测基板13的温度,温度的辐射温度计34。传感器17,其用于检测静电吸引机构的温度;比较器38,当输入各自输出的检测信号并且两个检测信号之差在满足规定条件的范围内时,输出比较器38,该信号用于操作静电吸引机构。 。如果操作静电吸引机构并且固定衬底,并且当衬底的温度和静电吸引机构的温度之间的差变小到包括在静电吸附机构中的程度时,将衬底放置在静电吸引机构上。规定的范围内,静电吸引机构被操作。;版权所有:(C)2002,日本特许厅

著录项

  • 公开/公告号JP2002009141A

    专利类型

  • 公开/公告日2002-01-11

    原文格式PDF

  • 申请/专利权人 ANELVA CORP;

    申请/专利号JP20000190385

  • 发明设计人 KOBAYASHI MASAHIKO;

    申请日2000-06-26

  • 分类号H01L21/68;C23C14/50;C23C16/458;C23F4/00;H01L21/203;H01L21/205;H01L21/3065;

  • 国家 JP

  • 入库时间 2022-08-22 00:53:41

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