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Air purifying matrix for the oxidation of air-borne particulate and gases

机译:空气净化基质,用于氧化空气中的微粒和气体

摘要

The present invention is an air purifying matrix to remove, reduce or detoxify organic pollutants. The matrix has an inert substrate, a photoreactive semiconductor material, and aqueous particles. The inert substrate is water absorbent, transparent to ultraviolet light, able to withstand extended periods of exposure to all wavelengths of ultraviolet light side of the spectrum without decomposing or altering the structure thereof, able to withstand high concentrations of hydroxyl radicals without decomposing or altering the structure thereof, and in the form of an expanded granular type with spaces therein. The photoreactive semiconductor material is crystallized within the spaces. And the aqueous particles are within the spaces to form photoreactive metal semiconductor material nano-reactors within the matrix. These nano-reactors generate high concentrations of hydroxyl radicals which surround and diffuse through the matrix, and remove, reduce or detoxify organic pollutants within and surrounding the matrix. Moreover, the ultraviolet light is at a wavelength which the semiconductor material photoreacts.
机译:本发明是用于去除,减少或去除有机污染物的空气净化基质。基质具有惰性基材,光反应性半导体材料和水性颗粒。惰性基材是吸水剂,对紫外线透明,能够承受长时间暴露在光谱的所有波长的紫外线下而不会分解或改变其结构,能够承受高浓度的羟基自由基而不会分解或改变其结构,并以其中具有空间的膨胀颗粒形式存在。光反应性半导体材料在空间内结晶。并且水性颗粒在该空间内以在基质内形成光反应性金属半导体材料纳米反应器。这些纳米反应器产生高浓度的羟基自由基,这些羟基自由基围绕并扩散穿过基质,并去除,减少或解毒基质内部和周围的有机污染物。另外,紫外线是半导体材料发生光反应的波长。

著录项

  • 公开/公告号US6426312B1

    专利类型

  • 公开/公告日2002-07-30

    原文格式PDF

  • 申请/专利权人 LUSH DONALD LAWRENCE;

    申请/专利号US20000664038

  • 发明设计人

    申请日2000-09-18

  • 分类号B01J211/60;B01J210/60;

  • 国家 US

  • 入库时间 2022-08-22 00:47:52

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