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Low-reflectance glass article and process for preparing the same

机译:低反射玻璃制品及其制备方法

摘要

The present invention is a low reflection glass article which is prepared by laminating a first layer which has a middle refractive index (n1) from 1.60 to 1.95 and has a film thickness of (60 to 130 nm)/n1, a second layer which has a high refractive index (n2) which is in a range from 1.91 to 2.60 and higher than the refractive index of said first layer by at least 0.20 and has a film thickness of (140 to 230 nm)/n2, and a third layer which has a low refractive index (n3) which is in a range from 1.35 to 1.59 and lower than the refractive index of said first layer by at least 0.20 and has a film thickness of (110 to 150 nm)/n3 in this order on a transparent glass substrate having a refractive index from 1.47 to 1.53, wherein said second layer contains titanium oxide and other metal oxides in an amount of 70 mol % or more in total, said third layer contains a silicon oxide in an amount from 50 to 100 mol % and said metal oxides in an amount from 0 to 10 mol % in total, and said first layer contains a silicon oxide in an amount from 15 to 80 mol % and said metal oxides in an amount from 20 to 70 mol % in total.;According to the present invention, there can be provided a low reflection glass article coated with an optical multi-layer film which can reduce the reflectivity in wide visible light range.
机译:本发明是一种低反射玻璃制品,其是通过层压第一层制成的,该第一层的中折射率(n 1 )为1.60至1.95,膜厚为(60至130nm) / n 1 ,第二层,其折射率高(n 2 ),该折射率在1.91至2.60的范围内,并且高于所述第一层的折射率至少为0.20,膜厚度为(140至230 nm)/ n 2 ,第三层的低折射率(n 3 )为在透明玻璃上的厚度为1.35至1.59且比所述第一层的折射率低至少0.20,并且膜厚度为(110至150 nm)/ n 3 具有1.47至1.53的折射率的基板,其中所述第二层包含总量为70mol%或更多的氧化钛和其他金属氧化物,所述第三层包含50到100mol%的氧化硅和说金属所述第一层包含的氧化硅的总量为0至10mol%,并且所述第一层包含的氧化硅的总量为15至80mol%,并且所述金属氧化物的总量为20至70mol%。本发明可以提供一种低反射玻璃制品,该低反射玻璃制品涂覆有光学多层膜,该光学多层膜可以降低在宽可见光范围内的反射率。

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