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Film thickness measuring method, polishing method, fabrication method of thin film magnetic head and substrate for forming the thin film magnetic head
Film thickness measuring method, polishing method, fabrication method of thin film magnetic head and substrate for forming the thin film magnetic head
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机译:膜厚测量方法,抛光方法,薄膜磁头的制造方法和用于形成薄膜磁头的基板
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摘要
The present invention relates to a film thickness measuring method measuring a film thickness of an element formation layer formed on a substrate and its object is to provide a film thickness measuring method which can measure a residual film thickness of a polishing object film in a polishing process at a high accuracy. In a fabrication method of a thin film magnetic head, alumina is coated over a dummy layer 54 and a bottom shielding layer 16 after forming the dummy layer 54 along with the bottom shielding layer 16 and a planarized layer 24 is formed by polishing the surface thereof using a CMP. Next, after forming a top shielding layer 32 over the bottom shielding layer 16, a planarized layer 38 is form by embedding alumina. A film thickness of an embedded 38 on the dummy layer 54 is measured by a non-contact optical film thickness measuring equipment and a film thickness of the top shielding layer 32 is measured based on the film thickness.
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