HIGH FLOW VACUUM CHAMBER INCLUDING EQUIPMENT MODULES SUCH AS PLASMA GENERATING SOURCE, VACUUM PUMPING ARRANGEMENT AND/ OR CANTILEVERED SUBSTRATE SUPPORT

摘要

A vacuum chamber apparatus having a substrate support (70) removably mounted therein in a cantilever fashion comprising: a substrate support mounted in an interior (30) of a vacuum processing chamber (10), the chamber being a plasma processing chamber wherein plasma is provided in a region adjacent the substrate support; an opening (14) in a sidewall (12) of the chamber, the opening being large enough to allow the substrate support to be removed from the chamber through the opening; and a mounting arrangement (90) extending through the opening and removably supporting the substrate support in the interior of the chamber at a position located inwardly of an inner sidewall surface of the chamber. 1507 כ' בתמוז התשס" ב - June 30, 2002