POSITION DETERMINING DEVICE, POSITION DETERMINING METHOD AND EXPOSURE DEVICE, EXPOSURE METHOD AND ALIGNMENT DETERMINING DEVICE, AND ALIGNMENT DETERMINING METHOD

摘要

This position measuring device comprising a calculation unit 19 calculates markposition information relating to the position of the mark by using a mark signal obtainedby irradiating a detection beam onto the mark formed on an object W, and a correctiondevice 19 for correcting the calculation results from the calculation unit 19 based on theasymmetry of the mark signal. As a result, positional deviation resulting from asymmetry can be detected, and bycorrecting for this deviation the effect that the image asymmetry has on the measurementcan be reduced. Therefore, a more accurate high precision alignment can be performed,and there is no requirement to increase the NA of the detection optical system, nor toprepare a special short wavelength light source, meaning increases in the size and cost ofthe apparatus can also be prevented.