Process for establishing mask lay-out data for simulating a lithographic process and for defining an optimized mask lay-out data; corresponding equipment and programs

摘要

The method involves defining original data specifying an original layout and automatically computing new layout data similar to the original layout in terms of the geometry of a mask generated from the original data. The new data are computed based on rules related to deviations in layout geometry from a mask manufactured from this layout or modeled from the layout by following steps of a manufacturing process. The method involves predefining original data (12) specifying an original layout (10) and automatically computing new data (54) specifying a new layout (42) from the original data, whereby the new layout is similar to the original layout in terms of the geometry of a mask (22) generated from the original data. The new data are computed based on rules related to deviations in the geometry of a layout from a mask manufactured from this layout or modeled from the layout by following the steps of the manufacturing process. Independent claims are also included for the following: an arrangement for generating mask layout data, especially a data processing system, a program with a command sequence for implementation by a data processing system and an integrated circuit structure.