Process for establishing mask lay-out data for simulating a lithographic process and for defining an optimized mask lay-out data; corresponding equipment and programs

摘要

is described, inter alia, a method for generating mask layout data for lithography simulation. There are specified source data (12) defining an initial layout (10). Starting from the original data, new data (54) are automatically calculated (34). The new data (54) are calculated on the basis of rules (34) based on deviations in the geometry of a layout from a layout produced by this mask (38, 40). A complex simulation of the process steps of the manufacturing process is avoided by this procedure.