PLASMA TREATMENT DEVICE METHOD FOR TESTING PERFORMANCE OF PLASMA TREATMENT DEVICE OR PLASMA TREATMENT SYSTEM METHOD FOR MAINTAINING THEREOF SYSTEM FOR MANAGING PERFORMANCE AND SYSTEM FOR CHECKING PERFORMANCE

摘要

PURPOSE: To provide a performance management system for managing the plasma processing apparatus or system located at the customer site to exhibit a required performance and for immediately performing corrective actions when the required performance is not achieved. CONSTITUTION: The plasma processing apparatus includes a plasma processing chamber(CN) having an electrode(4) for exciting a plasma; a radiofrequency generator(1) connected to the electrode; and an impedance matching circuit(2A) for performing the impedance matching between the plasma processing chamber and the radiofrequency generator. The performance of the apparatus is evaluated whether or not three times the first series resonant frequency of the plasma processing chamber is larger than the power frequency supplied to the plasma processing chamber.