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Bonding pad of semiconductor memory device for improving adhesive strength bonding pad and bonding wire and method of manufacturing the same

机译:用于提高粘合强度的半导体存储器件的键合焊盘和键合线及其制造方法

摘要

PURPOSE: A bonding pad of a semiconductor device having a step and a manufacturing method thereof are provided to the adhesion force of a bonding wire and a bonding pad by increasing an adhesion area of the bonding wire and pad. CONSTITUTION: The bonding pad(17) has a contact hole formed by patterning an insulation film(13) at a position to form the bonding pad by using a photoresist etching technology and has a conductive material formed on the contact hole and the insulation film. The step(20) is formed on the surface of the bonding pad. The bonding pad has the contact material between the contact hole and the pad. The step is formed by the contact hole.
机译:用途:通过增加键合线和焊盘的粘合面积,来向具有键合线和键合焊盘的粘合力的半导体装置的键合焊盘及其制造方法提供该键合焊盘和键合焊盘。组成:焊盘(17)上有一个接触孔,该孔是通过使用光刻胶蚀刻技术在要形成焊盘的位置上对绝缘膜(13)进行构图而形成的,并具有在接触孔和绝缘膜上形成的导电材料。台阶(20)形成在焊盘的表面上。接合垫在接触孔和垫之间具有接触材料。该台阶由接触孔形成。

著录项

  • 公开/公告号KR20020059952A

    专利类型

  • 公开/公告日2002-07-16

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20010001131

  • 发明设计人 KIM YEONG DAE;RYU JAE HYEON;

    申请日2001-01-09

  • 分类号H01L21/60;

  • 国家 KR

  • 入库时间 2022-08-22 00:30:36

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