Fabrication method of SPM probe tips using P+ silicon cantilevers realized in 110bulk silicon wafer

摘要

The present invention relates to a probe used in a surface scanning microscope and a manufacturing method thereof. The present invention comprises a cantilever manufactured using silicon having a 100 lattice direction, a body supporting the cantilever, and a needle formed at one end of the cantilever, and boron is diffused in a predetermined region of the body and the cantilever. It is characterized by being.;According to the present invention, a first mask layer is formed on a silicon substrate, the silicon substrate is etched to a predetermined depth using the first mask layer to form the needle, the first mask layer is removed, and the body and the cantilever are A second mask layer is formed on the silicon substrate except for the region to be formed. Then, using the second mask layer to form a boron diffusion layer by diffusing boron in a predetermined region of the body and the region where the cantilever will be formed, remove the second mask layer, and then form a third mask layer on the boron diffusion layer, A predetermined region of the exposed silicon substrate is etched using the 3 mask layer to form the body and the cantilever.