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Planar typed arc ion plating apparatus using cathodic arc discharge

机译:使用阴极电弧放电的平面型电弧离子镀装置

摘要

The present invention discloses a negative electrode arc coating apparatus for uniformly generating an arc in a flat cathode by using a magnetic field generated by a permanent magnet mounted behind a negative electrode target to enable uniform coating on a large area. The negative electrode arc coating apparatus of the present invention is a target insulating portion for placing and insulating a target, a cooling portion for cooling the target, and a movement path of electrons generated on the target surface, and is generated on an upper portion of the target. An auxiliary anode for stabilizing the arc, a shield for shielding the arc from leaving the target, and a movable portion for limiting the movement of the arc into the surface of the target and guiding it to the front surface over the target surface. It includes a permanent magnet part. The negative electrode arc coating apparatus of the present invention increases the erosion rate of the expensive target through precise control of the magnetic field, uniformly coating a high-functional thin film such as TiN, CrN, AlN, WC by introducing a reactive gas into the chamber.
机译:本发明公开了一种负极电弧涂敷装置,该负极电弧涂敷装置通过利用安装在负极靶的后方的永磁体产生的磁场在平坦的阴极上均匀地产生电弧,从而能够在大面积上均匀地涂敷。本发明的负极电弧涂覆装置是用于放置和绝缘靶的靶绝缘部,用于冷却靶的冷却部以及在靶表面上产生的电子的移动路径,并且在靶的上部产生。目标。用于使电弧稳定的辅助阳极,用于保护电弧不离开靶材的屏蔽件,以及用于限制电弧向靶材的表面内的运动并将其引导至靶材表面上的前表面的可动部。它包括一个永磁部件。本发明的负电极电弧涂覆设备通过精确控制磁场来增加昂贵靶材的腐蚀速率,通过向反应器中引入反应气体来均匀涂覆诸如TiN,CrN,AlN,WC的高功能薄膜。室。

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